Appl. Phys. Express 2 (2009) 071004 (3 pages)  |Previous Article| |Next Article|  |Table of Contents|
|Full Text PDF: FREE (577K)|

Room-Temperature Red Emission from a p-Type/Europium-Doped/n-Type Gallium Nitride Light-Emitting Diode under Current Injection

Atsushi Nishikawa, Takashi Kawasaki, Naoki Furukawa, Yoshikazu Terai, and Yasufumi Fujiwara

Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka Universtiy, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan

(Received June 3, 2009; accepted June 8, 2009; published online June 26, 2009)

We have succeeded in the growth of europium (Eu)-doped GaN layer grown by organometallic vapor-phase epitaxy (OMVPE) and demonstrated the first low-voltage operation of current-injected red emission from a p-type/Eu-doped/n-type GaN light-emitting diode (LED) at room temperature. The bright red emission was obtained with an applied voltage as low as 3 V under normal lighting conditions. At a dc current of 20 mA, the output power, integrated over the 5D07F2 transition in Eu3+ ions (around 621 nm), was 1.3 µW. This result suggests a novel way to realize GaN-based red LEDs and monolithic devices comprising red, green and blue GaN-based LEDs. ©2009 The Japan Society of Applied Physics

URL: http://apex.ipap.jp/link?APEX/2/071004/
DOI: 10.1143/APEX.2.071004


|Full Text PDF: FREE (577K)| Citation:

References | Citing Articles (4)

  1. A. J. Steckl, J. C. Heikenfeld, D.-S. Lee, M. J. Garter, C. C. Baker, Y. Wang, and R. Jones: IEEE J. Sel. Top. Quantum Electron. 8 (2002) 749.
  2. A. J. Steckl, J. H. Park, and J. M. Zavada: Mater. Today 10 (2007) Nos. 7–8, 20.
  3. P. N. Favennec, H. L'Haridon, M. Salvi, D. Moutonnet, and Y. LeGuillou: Electron. Lett. 25 (1989) 718.
  4. A. Koizumi, Y. Fujiwara, K. Inoue, A. Urakami, T. Yoshikane, and Y. Takeda: Jpn. J. Appl. Phys. 42 (2003) 2223[IPAP].
  5. A. Koizumi, Y. Fujiwara, A. Urakami, K. Inoue, T. Yoshikane, and Y. Takeda: Appl. Phys. Lett. 83 (2003) 4521[AIP Scitation].
  6. A. J. Steckl, M. Garter, R. Birkhahn, and J. Scofield: Appl. Phys. Lett. 73 (1998) 2450[AIP Scitation].
  7. J. M. Zavada, S. X. Jin, N. Nepal, J. Y. Lin, H. X. Jiang, P. Chow, and B. Hertog: Appl. Phys. Lett. 84 (2004) 1061[AIP Scitation].
  8. J. Heikenfeld, M. Garter, D. S. Lee, R. Birkhahn, and A. J. Steckl: Appl. Phys. Lett. 75 (1999) 1189[AIP Scitation].
  9. S. Morishima, T. Maruyama, M. Tanaka, Y. Masumoto, and K. Akimoto: Phys. Status Solidi A 176 (1999) 113[CrossRef].
  10. H. J. Lozykowski, W. M. Jadwisienczak, J. Han, and I. G. Brown: Appl. Phys. Lett. 77 (2000) 767[AIP Scitation].
  11. J. H. Park and A. J. Steckl: Appl. Phys. Lett. 85 (2004) 4588[AIP Scitation].
  12. J. H. Park and A. J. Steckl: J. Appl. Phys. 98 (2005) 056108[AIP Scitation].
  13. M. Pan and A. J. Steckl: Appl. Phys. Lett. 83 (2003) 9[AIP Scitation].
  14. J. Laski, K. Klinedinst, M. Raukas, K. C. Mishra, J. Tao, J. McKittrick, and J. B. Talbot: J. Electrochem. Soc. 155 (2008) J315.
  15. G. H. Dieke and H. M. Crosswhite: Appl. Opt. 2 (1967) 675.
  16. C.-W. Lee, H. O. Everitt, D. S. Lee, A. J. Steckl, and J. M. Zavada: J. Appl. Phys. 95 (2004) 7717[AIP Scitation].

|TOP|  |Previous Article| |Next Article|  |Table of Contents| |APEX Home|
Copyright © 2010 The Japan Society of Applied Physics
Contact Information