Appl. Phys. Express 1 (2008) 091602 (3 pages) |Previous Article| |Next Article| |Table of Contents|
|Full Text PDF: FREE (1628K)|
Thickness Dependence of the Dielectric Properties of Epitaxial SrTiO3 Films on (001)Pt/SrTiO3
Damien S. Boesch,
Junwoo Son,
James M. LeBeau,
Joël Cagnon, and
Susanne Stemmer
Materials Department, University of California, Santa Barbara, CA 93106-5050, U.S.A.
(Received August 3, 2008; accepted August 22, 2008; published online September 12, 2008)
Epitaxial, (001)-oriented SrTiO3 thin films were grown by sputtering on (001)Pt/SrTiO3 substrates to thicknesses ranging from 20 to 160 nm. Their dielectric properties were studied using parallel-plate capacitor structures. For film thicknesses greater than 40 nm, the thickness dependence of the capacitance density could be described with a model of low-permittivity interfacial layers that are connected in series with the bulk of the film. Thinner films showed a deviation from the linear relationship between the inverse capacitance density and thickness. They also showed an increase in loss and a small, power-law frequency dependence of the capacitance. These changes were indicative of different bulk dielectric properties of the thinnest SrTiO3 films.
©2008 The Japan Society of Applied Physics
URL:
http://apex.ipap.jp/link?APEX/1/091602/
DOI: 10.1143/APEX.1.091602
- K. Abe and S. Komatsu:
Jpn. J. Appl. Phys. 32 (1993) L1157[IPAP].
- J. J. Lee, P. Alluri, and S. K. Dey:
Appl. Phys. Lett. 65 (1994) 2027[AIP Scitation].
- C. Zhou and D. M. Newns:
J. Appl. Phys. 82 (1997) 3081[AIP Scitation].
- C. Basceri, S. K. Streiffer, A. I. Kingon, and R. Waser:
J. Appl. Phys. 82 (1997) 2497[AIP Scitation].
- S. Zafar, R. E. Jones, P. Chu, B. White, B. Jiang, D. Taylor, P. Zurcher, and S. Gillepsie:
Appl. Phys. Lett. 72 (1998) 2820[AIP Scitation].
- C. S. Hwang:
J. Appl. Phys. 92 (2002) 432[AIP Scitation].
- C. B. Parker, J.-P. Maria, and A. I. Kingon:
Appl. Phys. Lett. 81 (2002) 340[AIP Scitation].
- L. J. Sinnamon, R. M. Bowman, and J. M. Gregg:
Appl. Phys. Lett. 78 (2001) 1724[AIP Scitation].
- M. Stengel and N. A. Spaldin:
Nature 443 (2006) 679[CrossRef].
- A. K. Tagantsev and G. Gerra:
J. Appl. Phys. 100 (2006) 051607[AIP Scitation].
- C. A. Mead:
Phys. Rev. Lett. 6 (1961) 545[APS].
- A. K. Theophilo and A. Modinos:
Phys. Rev. B 6 (1972) 801[APS].
- J. D. Baniecki, M. Ishii, K. Kurihara, and K. Yamanaka: Proc. 16th IEEE Int. Symp. Applications of Ferroelectrics, 2007, p. 180.
- T. W. Hickmott:
J. Appl. Phys. 89 (2001) 5502[AIP Scitation].
- M. M. Saad, P. Baxter, R. M. Bowman, J. M. Gregg, F. D. Morrison, and J. F. Scott:
J. Phys.: Condens. Matter 16 (2004) L451[IoP STACKS].
- N. A. Pertsev, R. Dittmann, R. Plonka, and R. Waser:
J. Appl. Phys. 101 (2007) 074102[AIP Scitation].
- J. W. Lu, S. Schmidt, Y.-W. Ok, S. P. Keane, and S. Stemmer:
J. Appl. Phys. 98 (2005) 054101[AIP Scitation].
- J. Son, J. Cagnon, D. S. Boesch, and S. Stemmer:
Appl. Phys. Express 1 (2008) 061603[IPAP].
- K. Thürmer, R. Koch, M. Weber, and K. H. Rieder:
Phys. Rev. Lett. 75 (1995) 1767[APS].
- N. H. Finstrom, J. Cagnon, and S. Stemmer:
J. Appl. Phys. 101 (2007) 034109[AIP Scitation].
- N. H. Finstrom, J. A. Gannon, N. K. Pervez, R. A. York, and S. Stemmer:
Appl. Phys. Lett. 89 (2006) 242910[AIP Scitation].
- J. D. Baniecki, R. B. Laibowitz, T. M. Shaw, P. R. Duncombe, D. A. Neumayer, D. E. Kotecki, H. Shen, and Q. Y. Ma:
Appl. Phys. Lett. 72 (1998) 498[AIP Scitation].