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Thickness Dependence of the Dielectric Properties of Epitaxial SrTiO3 Films on (001)Pt/SrTiO3

Damien S. Boesch, Junwoo Son, James M. LeBeau, Joël Cagnon, and Susanne Stemmer

Materials Department, University of California, Santa Barbara, CA 93106-5050, U.S.A.

(Received August 3, 2008; accepted August 22, 2008; published online September 12, 2008)

Epitaxial, (001)-oriented SrTiO3 thin films were grown by sputtering on (001)Pt/SrTiO3 substrates to thicknesses ranging from 20 to 160 nm. Their dielectric properties were studied using parallel-plate capacitor structures. For film thicknesses greater than 40 nm, the thickness dependence of the capacitance density could be described with a model of low-permittivity interfacial layers that are connected in series with the bulk of the film. Thinner films showed a deviation from the linear relationship between the inverse capacitance density and thickness. They also showed an increase in loss and a small, power-law frequency dependence of the capacitance. These changes were indicative of different bulk dielectric properties of the thinnest SrTiO3 films. ©2008 The Japan Society of Applied Physics

URL: http://apex.ipap.jp/link?APEX/1/091602/
DOI: 10.1143/APEX.1.091602


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References | Citing Articles (2)

  1. K. Abe and S. Komatsu: Jpn. J. Appl. Phys. 32 (1993) L1157[IPAP].
  2. J. J. Lee, P. Alluri, and S. K. Dey: Appl. Phys. Lett. 65 (1994) 2027[AIP Scitation].
  3. C. Zhou and D. M. Newns: J. Appl. Phys. 82 (1997) 3081[AIP Scitation].
  4. C. Basceri, S. K. Streiffer, A. I. Kingon, and R. Waser: J. Appl. Phys. 82 (1997) 2497[AIP Scitation].
  5. S. Zafar, R. E. Jones, P. Chu, B. White, B. Jiang, D. Taylor, P. Zurcher, and S. Gillepsie: Appl. Phys. Lett. 72 (1998) 2820[AIP Scitation].
  6. C. S. Hwang: J. Appl. Phys. 92 (2002) 432[AIP Scitation].
  7. C. B. Parker, J.-P. Maria, and A. I. Kingon: Appl. Phys. Lett. 81 (2002) 340[AIP Scitation].
  8. L. J. Sinnamon, R. M. Bowman, and J. M. Gregg: Appl. Phys. Lett. 78 (2001) 1724[AIP Scitation].
  9. M. Stengel and N. A. Spaldin: Nature 443 (2006) 679[CrossRef].
  10. A. K. Tagantsev and G. Gerra: J. Appl. Phys. 100 (2006) 051607[AIP Scitation].
  11. C. A. Mead: Phys. Rev. Lett. 6 (1961) 545[APS].
  12. A. K. Theophilo and A. Modinos: Phys. Rev. B 6 (1972) 801[APS].
  13. J. D. Baniecki, M. Ishii, K. Kurihara, and K. Yamanaka: Proc. 16th IEEE Int. Symp. Applications of Ferroelectrics, 2007, p. 180.
  14. T. W. Hickmott: J. Appl. Phys. 89 (2001) 5502[AIP Scitation].
  15. M. M. Saad, P. Baxter, R. M. Bowman, J. M. Gregg, F. D. Morrison, and J. F. Scott: J. Phys.: Condens. Matter 16 (2004) L451[IoP STACKS].
  16. N. A. Pertsev, R. Dittmann, R. Plonka, and R. Waser: J. Appl. Phys. 101 (2007) 074102[AIP Scitation].
  17. J. W. Lu, S. Schmidt, Y.-W. Ok, S. P. Keane, and S. Stemmer: J. Appl. Phys. 98 (2005) 054101[AIP Scitation].
  18. J. Son, J. Cagnon, D. S. Boesch, and S. Stemmer: Appl. Phys. Express 1 (2008) 061603[IPAP].
  19. K. Thürmer, R. Koch, M. Weber, and K. H. Rieder: Phys. Rev. Lett. 75 (1995) 1767[APS].
  20. N. H. Finstrom, J. Cagnon, and S. Stemmer: J. Appl. Phys. 101 (2007) 034109[AIP Scitation].
  21. N. H. Finstrom, J. A. Gannon, N. K. Pervez, R. A. York, and S. Stemmer: Appl. Phys. Lett. 89 (2006) 242910[AIP Scitation].
  22. J. D. Baniecki, R. B. Laibowitz, T. M. Shaw, P. R. Duncombe, D. A. Neumayer, D. E. Kotecki, H. Shen, and Q. Y. Ma: Appl. Phys. Lett. 72 (1998) 498[AIP Scitation].

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